Persistent URL of this record https://hdl.handle.net/1887/87508
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Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications
- All authors
- Saedi, M.; Sfiligoj, C.; Verhoeven, J.; Frenken, J.W.M.
- Date
- 2020-03-30
- Journal
- Applied Surface Science
- Volume
- 507
- Pages
- 144951