Persistent URL of this record https://hdl.handle.net/1887/86160
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- Applied_Physics_Letters_98_2011_174102
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Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices
- All authors
- Rosso, M.; Steijn, V. van; Smet, L.C.PM. de; Sudholter, E.J.R.; Kleijn, C.R.; Kreutzer, M.T.
- Date
- 2011-04-25
- Journal
- Applied Physics Letters
- Volume
- 98
- Issue
- 17
- Pages
- 174102