Persistent URL of this record https://hdl.handle.net/1887/85799
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The key role of very-low-energy-electrons in tin-based molecular resists for extreme ultraviolet nanolithography
- All authors
- Bespalov, I.; Zhang, Y.; Haitjema, J.; Tromp, R.M.; Molen, S.J. van der; Brouwer, A.M.; Jobst, J.; Castellanos, S.
- Date
- 2020-02-04
- Volume
- 12
- Issue
- 8
- Pages
- 9881 - 9889