The key role of very-low-energy-electrons in tin-based molecular resists for extreme ultraviolet nanolithography
Author(s):
Bespalov, I.; Zhang, Y.; Haitjema, J.; Tromp, R.M.; Molen, S.J. van der (0000-0003-3181-2055); Brouwer, A.M.; Jobst, J. (0000-0002-2422-1209); Castellanos, S.
Published
2020
Publication type
Article / Letter to editor
Date issued
2020-02-04
Language
English
Is part of
ACS Applied Materials and Interfaces (2020), Vol. 12, no. 8, p. 9881-9889
