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1887
60247
The extraordinary role of the AlN interlayer in growth of AlN sputtered on Ti electrodes
Author(s):
Tran, A.T.; Pandraud, G.; Tichelaar, F.D.; Nguyen, M.D.; Schellevis, H.; Sarro, P.M.
Published
2013
Publication type
Article / Letter to editor
Date issued
2013-11-25
Language
English
Is part of
APPLIED PHYSICS LETTERS (2013), Vol. 103, no. 22, p. 221909
hdl
1887/60247
doi
10.1063/1.4835035
Persistent identifier url
https://hdl.handle.net/1887/60247
Documents
01 - Applied_Physics_Letters_103oe2013oe221909
version: Not Applicable (or Unknown)
Full text at Publisher's site
Open Access