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Hückmann, L; Cottom, J.P.; Meyer, J.; Olsson, E. (2026)

Topology-directed silicide formation: an explanation for the growth of C49-TiSi2 on the Si(100) surface

Article / Letter to editor
All authors
Hückmann, L; Cottom, J.P.; Meyer, J.; Olsson, E.
Date
2026
Journal
Nanoscale Advances
Volume
8
Issue
18
Pages
5256 - 5266
DOI
doi:10.1039/d6na00467a
Link
https://doi.org/10.1039/d6na00467a