Persistent URL of this record https://hdl.handle.net/1887/4307983
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Response of Chlorella vulgaris to exposure to CuO NPs: contributions of particulate and dissolved metal forms as modulated by tannic acid and pH
- All authors
- Liu, Y.; Wang, X.; Pan, B.; Wei, Z.; Zhao, J.; Qiu, H.; Steinberg, C.E.W.; Peijnenburg, W.J.G.M.; Vijver, M.G.
- Date
- 2024-02-02
- Volume
- 272