Operando characterization and molecular simulations reveal the growth kinetics of graphene on liquid copper during chemical vapor deposition

Author(s):
Rein, V.; Gao, H.; Heenen, H.H.; Sghaier, W.; Manikas, A.C.; Tsakonas, C.; Saedi, M.; Margraf, J.T.; Galiotis, C.; Renaud, G.; Konovalov, O.V.; Groot, I.M.N. (0000-0001-9747-3522); Reuter, K.; Jankowski, M.
Published
2024
Publication type
Article / Letter to editor
Date issued
2024-04-30
Language
English
Is part of
ACS Nano (2024), Vol. 18, no. 19, p. 12503-12511
hdl
1887/4178620
doi
10.1021/acsnano.4c02070