Vouw: geometric pattern mining using the MDL principle

Author(s):: Faas, M.; Leeuwen, M. van (0000-0002-0510-3549)

Editor(s):: Berthold, M.; Feelders, A.; Krempl, G.

Published: 2020
Publication type: Article in monograph or in proceedings

Date issued: 2020
Language: English
Publisher: Cham: Springer
Is part of: Advances in intelligent data analysis XVIII. IDA 2020 (2020), Pt. 12080, p. 158-170
ISBN source: 9783030445836
hdl: 1887/3281092
doi: 10.1007/978-3-030-44584-3_13

Conference

Meeting name: International Symposium on Intelligent Data Analysis (IDA 2020)
Meeting location: Konstanz, Germany
Meeting date: 2020-04-27 - 2020-04-29